New paper: “Three-dimensional nanofabrication using hydrogen silsesquioxane/poly(methylmethacrylate) bilayer resists” accepted to JVSTB
We developed two processes for fabricating three-dimensional nanostructures using a hydrogen silsesquioxane and poly(methylmethacrylate) bilayer resist stack. We demonstrated self-aligned mushroom-shaped posts and freestanding supported structures that were fabricated in a single electron-beam writing step without intermediate alignment.
