Topic: Resists
8.25.2014
New paper: “Three-dimensional nanofabrication using hydrogen silsesquioxane/poly(methylmethacrylate) bilayer resists” accepted to JVSTB
We developed two processes for fabricating three-dimensional nanostructures using a hydrogen silsesquioxane and poly(methylmethacrylate) bilayer resist stack. We demonstrated self-aligned mushroom-shaped posts and freestanding supported structures that were fabricated in... Read more >>
Tags: 3D Nanostructures, Electron-beam Lithography, HSQ, Nanofabrication, PMMA, Resists
New paper: “Three-dimensional nanofabrication using hydrogen silsesquioxane/poly(methylmethacrylate) bilayer resists” accepted to JVSTB
We developed two processes for fabricating three-dimensional nanostructures using a hydrogen silsesquioxane and poly(methylmethacrylate) bilayer resist stack. We demonstrated self-aligned mushroom-shaped posts and freestanding supported structures that were fabricated in... Read more >>
Tags: 3D Nanostructures, Electron-beam Lithography, HSQ, Nanofabrication, PMMA, Resists
