Electron-beam Lithography

New paper: “Three-dimensional nanofabrication using hydrogen silsesquioxane/poly(methylmethacrylate) bilayer resists” accepted to JVSTB

Aug 25, 2014 | News Articles, Our Research

We developed two processes for fabricating three-dimensional nanostructures using a hydrogen silsesquioxane and poly(methylmethacrylate) bilayer resist stack. We demonstrated self-aligned mushroom-shaped posts and freestanding supported structures that were fabricated...

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Quantum Nanostructures and
Nanofabrication Group

New paper: “Three-dimensional nanofabrication using hydrogen silsesquioxane/poly(methylmethacrylate) bilayer resists” accepted to JVSTB

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